Technology for Chemical Cleaning of Industrial Equipment
Frenier, Wayne W.
This book is a study of the improvements over the past three decades in the technology utilized to chemically clean industrial equipment. Topics include organic acid and chelant solvents, new inhibitors, improved techniques for removing refinery/chemical plant deposits, and the chemical mechanisms underlying many of the current processes.
Content:
Front Matter
Preface
Table of Contents
1. Introduction
2. Solvents for Removing Inorganic Deposits
3. Mechanisms of Iron Oxide and Copper Dissolution
4. Corrosion, Passivation, and Inhibition
5. Solvents for Removing Organic/Mixed Deposits
6. Disposal of Chemical Cleaning Wastes
7. Cleaning Nuclear Equipment
8. Special Techniques
General Conclusions
Index
Content:
Front Matter
Preface
Table of Contents
1. Introduction
2. Solvents for Removing Inorganic Deposits
3. Mechanisms of Iron Oxide and Copper Dissolution
4. Corrosion, Passivation, and Inhibition
5. Solvents for Removing Organic/Mixed Deposits
6. Disposal of Chemical Cleaning Wastes
7. Cleaning Nuclear Equipment
8. Special Techniques
General Conclusions
Index
Kategorie:
Rok:
2001
Wydawnictwo:
NACE International
Język:
english
Strony:
164
ISBN 10:
1615835490
ISBN 13:
9781615835492
Plik:
PDF, 9.90 MB
IPFS:
,
english, 2001
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